Bulk molybdenum field emitters by inductively coupled plasma etching
نویسندگان
چکیده
منابع مشابه
Inductively Coupled Plasma Etching of Bulk Titanium for MEMS Applications
Titanium is a promising new material system for the bulk micromachining of microelectromechanical MEMS devices. Titaniumbased MEMS have the potential to be used for a number of applications, including those which require high fracture toughness or biocompatibility. The bulk titanium etch rate, TiO2 mask etch rate, and surface roughness in an inductively coupled plasma ICP as a function of vario...
متن کاملTin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching
Tin Sn has the advantage of delivering higher conversion efficiency compared to other fuel materials e.g., Xe or Li in an extreme ultraviolet EUV source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in a lithography system leads to some additional challenges for maintaining a satisfactory lifetime of the collector optics. A critical i...
متن کاملEvolution of surface roughness of AlN and GaN induced by inductively coupled Cl2 ÕAr plasma etching
We study the effects of plasma etching on the evolution of surface roughness of GaN and AlN. The etch-induced roughness is investigated using atomic force microscopy by systematically varying plasma power, chamber pressure, and Cl2 /Ar mixture gas composition. GaN etches three to four times more rapidly than AlN for identical plasma conditions. For both GaN and AlN, we find that the surface rou...
متن کاملNanoshaping field emitters from glassy carbon sheets: a new functionality induced by H-plasma etching.
This paper reports on the morphological and electrical characterization at the nanometer scale and the investigation of the field emission characteristics of glassy carbon (GC) plates which underwent H-induced physical/chemical processes occurring in a dual-mode MW-RF plasma reactor. Plasma treatment produced on the GC surface arrays of vertically aligned conically shaped nanostructures, with d...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Physical Chemistry Chemical Physics
سال: 2016
ISSN: 1463-9076,1463-9084
DOI: 10.1039/c6cp06340c